Orono, ME, United States of America

Tomas Marangoni

This inventor holds 1 USPTO granted patent. Top assignee: Dupont Electronic Materials International, LLC. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomas Marangoni. Retrieved from https://idiyas.com/inventor/tomas-marangoni-w8zi87wa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Tomas Marangoni: Polymer and Photoresist Innovation.

Introduction

Tomas Marangoni is an inventor associated with Orono, Maine, and Dupont Electronic Materials International, LLC. His patent work concerns polymer chemistry and materials used in photoresist compositions and pattern formation.

Latest Patents

Marangoni is named on one patent: “Polymer, Photoresist Compositions Including the Same, and Pattern Formation Methods.” The invention describes a polymer with a first repeating unit containing an acid-labile group, an anionic end group selected from a carboxylate or sulfamate group, and an organic cation. The disclosed polymer is intended for use in photoresist compositions and pattern formation methods.

Career Highlights

Marangoni’s recorded patent activity highlights his contribution to research and development in electronic materials, particularly polymer systems relevant to photoresist applications. His listed affiliation is Dupont Electronic Materials International, LLC.

Collaborations

Huan He is identified as Marangoni’s coworker. Their shared professional context is associated with electronic materials and patent-related innovation.

Conclusion

Tomas Marangoni’s patent work reflects a focused contribution to polymer and photoresist technology, with applications in pattern formation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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