Prague, Czechia

Tomas Fejt

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Fox Biosystems Nv. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomas Fejt. Retrieved from https://idiyas.com/inventor/tomas-fejt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Tomas Fejt in Sputter Deposition Technology

Introduction

Tomas Fejt is an accomplished inventor based in Prague, Czech Republic. He has made significant contributions to the field of sputter deposition technology. His innovative approach has led to the development of a unique sputter deposition system that enhances the coating process for substrates.

Latest Patents

Tomas Fejt holds 1 patent for his invention titled "Sputter Deposition System." This invention relates to a sputter deposition system that features a rotatable substrate holder. The holder is designed to accommodate one or more substrates, allowing them to rotate around their own axis as well as around the rotation axis of the holder. This design facilitates the coating of substrates at their top end, ensuring a homogeneous deposition across the surface.

Career Highlights

Tomas Fejt is currently associated with Fox Biosystems NV, where he applies his expertise in sputter deposition technology. His work has been instrumental in advancing the capabilities of coating systems used in various applications.

Collaborations

Tomas collaborates with notable colleagues, including Filip Delport and Hana Fejtova. Their combined efforts contribute to the innovative projects at Fox Biosystems NV.

Conclusion

Tomas Fejt's contributions to sputter deposition technology exemplify the impact of innovative thinking in the field of materials science. His patent and ongoing work continue to influence advancements in substrate coating processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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