Bischofsheim, Germany

Tomas Backlund

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Flexenable Technology Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomas Backlund. Retrieved from https://idiyas.com/inventor/tomas-backlund-6dxnd4px

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Tomas Backlund

Introduction

Tomas Backlund is a notable inventor based in Bischofsheim, Germany. He has made significant contributions to the field of dielectric materials, particularly in modifying stress response and adhesion behavior through innovative mechanical property tuning.

Latest Patents

Tomas Backlund holds a patent titled "Modification of stress response and adhesion behavior of dielectric through tuning of mechanical properties." This patent discloses a dielectric stack that includes a dielectric layer formed from a dielectric material. The material consists of one or more constituent components, each having a Tg value of 70° C. or lower, and is annealed at a temperature exceeding the highest Tg value of the constituent components. This innovation has the potential to enhance the performance of dielectric materials in various applications.

Career Highlights

Throughout his career, Tomas has worked with several companies, including Flexenable Technology Limited and Promerus, LLC. His experience in these organizations has allowed him to develop and refine his expertise in dielectric materials and their applications.

Collaborations

Tomas has collaborated with various professionals in his field, including his coworker Rashmi Sachin Bhintade. Their joint efforts have contributed to advancements in dielectric technology.

Conclusion

Tomas Backlund's work in modifying dielectric materials showcases his innovative spirit and dedication to advancing technology. His patent and career achievements reflect his significant impact on the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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