Company Filing History:
Years Active: 2010
Title: The Innovations of Tom E Wang
Introduction
Tom E Wang is an accomplished inventor based in Milpitas, California. He has made significant contributions to the field of microcircuit technology. His innovative approach has led to the development of a unique patent that addresses critical challenges in current-change induced voltage changes.
Latest Patents
Tom E Wang holds a patent titled "Method and apparatus to limit current-change induced voltage changes in a microcircuit." This invention provides a method and apparatus for compensating for voltage changes caused by fluctuations in current. In one embodiment, a digital throttle unit is coupled to an instruction pipeline to generate a compensating current signal. This signal prompts a dummy load to consume the compensating current. Additionally, another embodiment features a counter that responds to changes in clock frequency, generating a ramp current signal that also directs a dummy load to consume a corresponding current.
Career Highlights
Tom E Wang is currently employed at Intel Corporation, a leading technology company known for its innovations in semiconductor manufacturing. His work at Intel has allowed him to explore and develop advanced technologies that enhance microcircuit performance. With a focus on improving voltage stability, his contributions are vital to the ongoing evolution of electronic devices.
Collaborations
Tom has collaborated with notable colleagues, including James Steven Burns and Kenneth D Shoemaker. Their combined expertise has fostered an environment of innovation and creativity, leading to advancements in microcircuit technology.
Conclusion
Tom E Wang's contributions to the field of microcircuit technology exemplify the spirit of innovation. His patent addresses significant challenges in voltage stability, showcasing his commitment to advancing technology. Through his work at Intel Corporation and collaborations with esteemed colleagues, he continues to make a lasting impact in the industry.