Toi Yue Becky Leung

Title: Toi Yue Becky Leung: Innovator in Semiconductor Technology

Introduction

Toi Yue Becky Leung is a prominent inventor based in Sunnyvale, California. She has made significant contributions to the field of semiconductor technology, holding a total of seven patents. Her innovative work focuses on advanced etching methods and dopant activation techniques that are crucial for semiconductor manufacturing.

Latest Patents

Among her latest patents is a method for plasma etching of mask materials. This exemplary etching method involves forming a plasma of a fluorine-containing precursor to produce plasma effluents. A first bias frequency is applied while forming the plasma, which is then used to etch a first layer of a photomask. The method also includes adjusting the bias frequency to etch a second layer of the photomask. Another notable patent is her gate electrode dopant activation method for semiconductor manufacturing. This method provides a way to form a doped silicon-containing material on a substrate, involving the deposition of a polycrystalline layer and subsequent laser annealing to achieve the desired dopant concentration.

Career Highlights

Toi Yue Becky Leung is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her work has been instrumental in advancing the technologies used in semiconductor fabrication.

Collaborations

She has collaborated with notable coworkers, including Jeffrey D. Chinn and Rolf A. Guenther, contributing to various innovative projects within her field.

Conclusion

Toi Yue Becky Leung's contributions to semiconductor technology through her patents and collaborations highlight her role as a leading inventor in the industry. Her work continues to influence advancements in semiconductor manufacturing processes.