This inventor holds 2 USPTO granted patents. Top assignee: Fujitsu Corporation. Active years: 1998-1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998-1999
Title: Tohru Ikeda: Innovator in Charged Particle Beam Technology
Introduction
Tohru Ikeda is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of charged particle beam technology, holding a total of 2 patents. His work has been instrumental in advancing exposure methods and devices used in various applications.
Latest Patents
Ikeda's latest patents include a "Charged Particle Beam Exposure Method and Apparatus" and an "Electron-Beam Exposure Device and a Method of Detecting a Mark Position." The charged particle beam exposure method is designed for an exposure apparatus that features multiple exposure systems, allowing simultaneous exposure of the same pattern. This method involves generating data related to patterns, deflecting a charged particle beam onto an object, and detecting any abnormalities during operation. The electron-beam exposure device includes a deflector for directing an electron beam and a system for detecting the position of a mark, utilizing multiple detectors and amplifiers to ensure consistent output regardless of the beam's deflected position.
Career Highlights
Ikeda is currently employed at Fujitsu Corporation, where he continues to innovate and develop advanced technologies. His expertise in charged particle beam systems has positioned him as a key figure in the industry.
Collaborations
Throughout his career, Ikeda has collaborated with notable colleagues, including Kazushi Ishida and Hiroshi Yasuda. These partnerships have fostered a collaborative environment that enhances innovation and technological advancement.
Conclusion
Tohru Ikeda's contributions to charged particle beam technology exemplify his dedication to innovation and excellence. His patents reflect a commitment to improving exposure methods and devices, making a lasting impact in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
