Todd R Murphy

Title: Todd R. Murphy: Innovator in Photoresist Technology

Introduction

Todd R. Murphy is a notable inventor based in Duluth, MN (US). He has made significant contributions to the field of photoresist technology, particularly through his innovative patent. His work has implications in various applications, including decorative processes.

Latest Patents

Todd R. Murphy holds a patent for a "Photoresist laminate including photoimageable adhesive layer." This invention features a photosensitive mask laminate that comprises a photoimageable, pressure-sensitive adhesive layer and a photoimageable masking layer. The laminate also includes a support layer and can incorporate a removable carrier layer and a release layer. The imaging process involves selective exposure to light or other radiation, leading to the development of a mask with void and mask areas. This mask is essential for protecting selected portions of a target surface during sandblast decorative processes.

Career Highlights

Todd is associated with The Chromaline Corporation, where he applies his expertise in photoresist technology. His role at the company allows him to further develop and refine his innovative ideas, contributing to advancements in the industry.

Collaborations

Todd has worked alongside talented individuals such as Ron Couture and Toshifumi Komatsu. Their collaborative efforts have likely enhanced the development of innovative solutions within their field.

Conclusion

Todd R. Murphy's contributions to photoresist technology exemplify the impact of innovation in industrial applications. His patent and work at The Chromaline Corporation highlight his role as a significant inventor in this specialized area.