The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 1995

Filed:

Apr. 02, 1993
Applicant:
Inventors:

Ron Couture, Duluth, MN (US);

Todd R Murphy, Duluth, MN (US);

Toshifumi Komatsu, Duluth, MN (US);

Assignee:

The Chromaline Corporation, Duluth, MN (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ;
U.S. Cl.
CPC ...
430260 ; 430156 ; 430162 ; 430175 ; 430176 ; 430258 ; 430273 ; 430287 ; 430909 ;
Abstract

A photosensitive mask laminate having a photoimageable, pressure sensitive adhesive layer and a photoimageable masking layer is disclosed. The laminate also includes a support layer, and it can include a removable carrier layer and a release layer. The laminate can be imaged by selective exposure to light or other radiation, and developing the laminate produces a mask having void and mask areas. The mask can then be used to protect selected portions of a target surface during a sandblast decorative process.


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