Elmira, NY, United States of America

Todd M Harvey


 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Todd M. Harvey: Innovator in Coating Stripping Technologies

Introduction

Todd M. Harvey is a notable inventor based in Elmira, NY (US). He has made significant contributions to the field of materials science, particularly in the area of coating technologies. With a focus on improving methods for stripping nitride coatings, his work has implications for various industrial applications.

Latest Patents

Todd M. Harvey holds a patent for a "Method for stripping nitride coatings." This innovative method involves stripping partially oxidized nitride wear or release coatings from metal workpieces. The process includes disrupting surface oxidation layers present on the coatings following use. It also causes electrical current to flow from the workpiece and release coating to a counter electrode while both are immersed in an aqueous alkaline electrolyte solution. This patent showcases his expertise in developing efficient and effective solutions for coating removal.

Career Highlights

Harvey is associated with Corning Incorporated, a leading company known for its advanced materials and technologies. His role at Corning has allowed him to work on cutting-edge projects that enhance manufacturing processes and product performance. His contributions have been instrumental in advancing the company's capabilities in materials engineering.

Collaborations

Throughout his career, Todd has collaborated with talented individuals such as Jiangwei Feng and Shrisudersan Jayaraman. These collaborations have fostered innovation and have led to the development of new technologies in the field.

Conclusion

Todd M. Harvey is a distinguished inventor whose work in coating technologies has made a significant impact in the industry. His patent for stripping nitride coatings exemplifies his innovative spirit and dedication to advancing materials science.

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