Warren, MI, United States of America

Todd E Durocher

This inventor holds 6 USPTO granted patents. Top assignee: Gm Global Technolgoy Operations, Inc.. Active years: 2004-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Todd E Durocher. Retrieved from https://idiyas.com/inventor/todd-e-durocher

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 33.3

Average Co-Inventor Count = 4.5

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2004-2026

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6 patents (USPTO):Explore Patents

Title: Todd E Durocher: Innovator in Adhesive Technology

Introduction

Todd E Durocher is a prominent inventor based in Warren, MI (US). He has made significant contributions to the field of adhesive technology, holding a total of 6 patents. His work focuses on developing innovative solutions for joining substrates, which has important applications in various industries.

Latest Patents

One of Todd's latest patents is a multilayer adhesive for thermal reversible joining of substrates. This invention includes a multilayer dry adhesive system capable of reversible joining of rigid substrates. This technology represents a significant advancement in adhesive applications, allowing for more versatile and efficient bonding methods.

Career Highlights

Todd is currently employed at GM Global Technology Operations LLC, where he continues to push the boundaries of adhesive technology. His expertise and innovative mindset have made him a valuable asset to the company and the industry as a whole.

Collaborations

Todd has collaborated with notable coworkers such as James R Spaulding and Craig A Rodriguez. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Todd E Durocher is a dedicated inventor whose work in adhesive technology has led to significant advancements in the field. His contributions continue to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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