Swamzey, NH, United States of America

Todd E Bottomley



Average Co-Inventor Count = 3.1

ph-index = 3

Forward Citations = 58(Granted Patents)


Location History:

  • Swamzey, NH (US) (1990)
  • Chesterfield, NH (US) (2011 - 2022)

Company Filing History:


Years Active: 1990-2022

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8 patents (USPTO):Explore Patents

Title: Todd E Bottomley: Innovator in Substrate Alignment Technology

Introduction

Todd E Bottomley is a notable inventor based in Swamzey, NH (US), recognized for his contributions to substrate alignment technology. With a total of 8 patents to his name, Bottomley has made significant advancements in the field, particularly in enhancing the efficiency and effectiveness of substrate processing.

Latest Patents

One of Bottomley's latest inventions is the High Speed Substrate Aligner Apparatus. This innovative device provides minimal substrate transporter extend and retract motions, allowing for quick alignment of substrates without causing damage to the backside. The design increases the throughput of substrate processing. In one embodiment, the aligner features an inverted chuck connected to a frame, along with a substrate transfer system that can transfer substrates from the chuck to the transporter without the need for rotational repositioning. This design eliminates obstruction of substrate fiducials and allows the transporter to remain within the frame during alignment. Another embodiment includes a rotatable sensor head connected to a frame and a substrate support with transparent rest pads, which support the substrate during alignment. This configuration also enables the transporter to stay within the frame during the alignment process. Additionally, the substrate alignment is performed independently of fiducial placement on the support pads. Other embodiments incorporate a buffer system for buffering substrates inside the apparatus, facilitating fast swapping of substrates.

Career Highlights

Throughout his career, Todd E Bottomley has worked with various companies, including Brooks Automation GmbH. His experience in the industry has contributed to his innovative approach to substrate alignment technology.

Collaborations

Bottomley has collaborated with notable professionals in the field, including Jairo Terra Moura and Martin Hosek. These collaborations have likely enriched his work and contributed to the development of his patented technologies.

Conclusion

Todd E Bottomley is a distinguished inventor whose work in substrate alignment technology has led to significant advancements in the field. His innovative patents and collaborations reflect his commitment to improving substrate processing efficiency.

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