Berlin, Germany

Tobias Struck

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Inventio Ag. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tobias Struck. Retrieved from https://idiyas.com/inventor/tobias-struck

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 43(Granted Patents)


Company Filing History:


Years Active: 2019

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2 patents (USPTO):Explore Patents

Title: The Innovations of Tobias Struck

Introduction

Tobias Struck is a notable inventor based in Berlin, Germany. He has made significant contributions to the field of technology, particularly with his innovative designs and patents. With a total of 2 patents, Struck has demonstrated his expertise and creativity in developing advanced solutions.

Latest Patents

One of Tobias Struck's latest patents is a display screen with a graphical user interface. This invention showcases his ability to enhance user experience through innovative design and functionality. His work in this area reflects the growing demand for intuitive and efficient technology in everyday devices.

Career Highlights

Throughout his career, Tobias Struck has worked with several prominent companies, including Inventio AG and Lapp Engineering AG. His experience in these organizations has allowed him to refine his skills and contribute to various projects that push the boundaries of technology.

Collaborations

Tobias has collaborated with talented individuals such as Enrico Senger and Lennart Svennsson-Hilford. These partnerships have fostered a creative environment that encourages innovation and the development of groundbreaking ideas.

Conclusion

Tobias Struck is a distinguished inventor whose work continues to impact the technology sector. His patents and collaborations highlight his commitment to innovation and excellence in design.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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