Amsterdam, Netherlands

Tobias Seidl

This inventor holds 1 USPTO granted patent. Top assignee: Dräger Safety Ag&co. Kgaa. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tobias Seidl. Retrieved from https://idiyas.com/inventor/tobias-seidl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovations of Tobias Seidl

Introduction

Tobias Seidl is an accomplished inventor based in Amsterdam, Netherlands. He has made significant contributions to the field of optical elements, particularly with his innovative approach to antifogging properties. His work is recognized for enhancing the functionality and usability of optical components.

Latest Patents

Tobias Seidl holds a patent for a component and optical element with antifogging properties. This invention features a non-fogging surface that incorporates a honeycomb structure, which consists of a plurality of honeycombs. This design effectively prevents fogging, making it particularly useful in various applications.

Career Highlights

Tobias is currently employed at Dräger Safety AG & Co. KGaA, where he continues to develop innovative solutions in safety technology. His expertise in optical elements has positioned him as a valuable asset to the company and the industry.

Collaborations

Throughout his career, Tobias has collaborated with notable colleagues, including Thomas Wuske and Jürgen Unger. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Tobias Seidl's contributions to the field of optical elements demonstrate his commitment to innovation and safety. His patent for antifogging components showcases his ability to address practical challenges in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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