Bern, Switzerland

Tobias Nef

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Haag-Streit Ag. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tobias Nef. Retrieved from https://idiyas.com/inventor/tobias-nef

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: The Innovations of Tobias Nef

Introduction

Tobias Nef is a notable inventor based in Bern, Switzerland. He has made significant contributions to the field of eye examination technology. His innovative approach has led to the development of a unique eye examining instrument.

Latest Patents

Tobias Nef holds a patent for an eye examining instrument. This instrument comprises a projection device and a concave screen. Additionally, it features a convex reflector, allowing an image to be projected by the projection device onto the convex reflector and subsequently reflected onto the concave screen. This invention enhances the efficiency and accuracy of eye examinations.

Career Highlights

Tobias Nef is associated with Haag-Streit AG, a company renowned for its advancements in ophthalmic instruments. His work at Haag-Streit AG has positioned him as a key player in the development of innovative eye care solutions. His dedication to improving eye examination techniques is evident in his patent and ongoing projects.

Collaborations

Tobias collaborates with talented individuals such as René Mueri and Philipp Gloor. Their combined expertise contributes to the advancement of eye care technology and the development of new instruments.

Conclusion

Tobias Nef's contributions to the field of eye examination technology are commendable. His innovative eye examining instrument showcases his commitment to enhancing healthcare solutions. Through his work at Haag-Streit AG and collaborations with skilled professionals, he continues to make a significant impact in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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