Tokorozawa, Japan

Tishihiko Toyama


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Tishihiko Toyama: Innovator in Wire Bonding Technology

Introduction

Tishihiko Toyama is a notable inventor based in Tokorozawa, Japan. He has made significant contributions to the field of wire bonding technology, which is essential in the semiconductor industry. His innovative approach has led to the development of a unique wire bonding method that enhances the efficiency and reliability of electronic connections.

Latest Patents

Tishihiko Toyama holds one patent for a wire bonding method. This method involves a two-step bonding process where a first bonding is performed to a pad of a die, followed by a second bonding to an interconnect wiring or lead. The process includes forming a bump on the pad and bending the wire during the wire cutting step to create a bent part, which is then bonded to the bump. This innovative technique ensures a strong connection between the pad and the interconnect wiring.

Career Highlights

Tishihiko Toyama is associated with Kabushiki Kaisha Shinkawa, a company known for its advancements in semiconductor manufacturing technology. His work has contributed to the company's reputation as a leader in the industry. His expertise in wire bonding has been instrumental in developing more efficient manufacturing processes.

Collaborations

Throughout his career, Tishihiko Toyama has collaborated with talented individuals such as Tatsunari Mii and Shinsuke Tei. These collaborations have fostered an environment of innovation and have led to advancements in wire bonding techniques.

Conclusion

Tishihiko Toyama's contributions to wire bonding technology exemplify the importance of innovation in the semiconductor industry. His patented method not only improves the bonding process but also enhances the overall reliability of electronic devices. His work continues to influence the field and inspire future advancements.

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