Kaohsiung, Taiwan

Tin-Hun Hung

This inventor holds 1 USPTO granted patent. Top assignee: Daily Polymer Co., Ltd.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tin-Hun Hung. Retrieved from https://idiyas.com/inventor/tin-hun-hung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 5.0

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Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: The Innovations of Tin-Hun Hung

Introduction

Tin-Hun Hung is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of liquid crystal orientation applications. His work is characterized by a focus on advanced materials and their applications in technology.

Latest Patents

Tin-Hun Hung holds a patent for "Diamine and polyamic acid derived therefrom for liquid crystal orientation applications." This patent describes a diamine that includes a specific structure, where X and Y are divalent groups selected from various chemical structures. The invention also details the preparation of a polyamic acid by reacting the diamine with a tetracarboxylic dianhydride. The resulting liquid crystal orienting film contains a polyimide converted from the polyamic acid. He has 1 patent to his name.

Career Highlights

Tin-Hun Hung is currently employed at Daily Polymer Co., Ltd. His work at the company has allowed him to explore innovative solutions in polymer chemistry and materials science. His research has implications for the development of advanced liquid crystal displays and other related technologies.

Collaborations

Tin-Hun Hung has collaborated with notable colleagues, including Chuan-Ter Yan and Chih-Hsiung Huang. These collaborations have contributed to the advancement of their shared research interests and innovations in the field.

Conclusion

Tin-Hun Hung's contributions to the field of liquid crystal orientation applications highlight his innovative spirit and dedication to advancing technology. His patent and work at Daily Polymer Co., Ltd. reflect his commitment to research and development in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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