This inventor holds 1 USPTO granted patent. Top assignee: Massachusetts Institute of Technology. Active years: 1995.
Company Filing History:
Years Active: 1995
Title: Innovations by Timothy J Dalton
Introduction
Timothy J Dalton is an accomplished inventor based in North Reading, MA (US). He has made significant contributions to the field of thin film measurement technology. His innovative approach has led to the development of a unique patent that enhances the precision of etching and deposition processes.
Latest Patents
Dalton holds a patent for an "Apparatus and method for real-time measurement of thin film layer." This invention introduces a new technique for measuring etching or deposition rate uniformity in situ using a CCD camera. The camera views the wafer during plasma processing, recording the temporal modulation of plasma emission or laser illumination reflected from the wafer. This modulation is caused by interferometry as thin films are etched or deposited. The measured etching rates compare very well with those determined by Helium-Neon laser interference. This technique is capable of measuring etching rates across 100-mm or larger wafers. It can resolve etch rate variations across a wafer or within a die. Additionally, the invention can be used to make endpoint determinations in etching operations as well as measuring the absolute thickness of thin films.
Career Highlights
Dalton's career is marked by his association with the Massachusetts Institute of Technology, where he has contributed to various research initiatives. His work has been instrumental in advancing the understanding of thin film technologies and their applications in various industries.
Collaborations
Throughout his career, Dalton has collaborated with notable colleagues, including Herbert H Sawin and William T Conner. These partnerships have fostered innovation and have led to significant advancements in their respective fields.
Conclusion
Timothy J Dalton's contributions to the field of thin film measurement technology exemplify the spirit of innovation. His patented techniques have the potential to revolutionize the way etching and deposition processes are conducted in various applications.