Company Filing History:
Years Active: 2013-2019
Title: Innovations of Timothy Andrew Johnson
Introduction
Timothy Andrew Johnson is a notable inventor based in Tigard, OR (US). He has made significant contributions to the field of metrology, particularly in the characterization of surface topography and via dimensions. With a total of 3 patents to his name, Johnson's work has advanced the understanding and measurement of critical dimensions in semiconductor manufacturing.
Latest Patents
One of Johnson's latest patents is focused on interferometric characterization of surface topography. This innovative metrology device characterizes a surface topography of a sample at different length scales. It combines interferometric data into blocks of varying lengths or filters the data to determine statistical moments or surface properties. The device also determines the best focus position for processing tools based on these length scales and local topography.
Another significant patent involves characterization for bottom critical dimension (BCD) and depth metrology. This optical metrology device determines physical characteristics of vias, such as through-silicon vias (TSV). It utilizes signal strength data for modeling BCD and refines the data to enhance accuracy. The device generates height and signal strength data, from which statistical properties are derived, allowing for improved measurement of the via's characteristics.
Career Highlights
Timothy Andrew Johnson is currently employed at Nanometrics Inc., where he continues to innovate in the field of optical metrology. His work has been instrumental in developing advanced measurement techniques that are crucial for the semiconductor industry.
Collaborations
Johnson has collaborated with notable colleagues, including Kevin Eduard Heidrich and John Allgair. Their combined expertise has contributed to the successful development of innovative metrology solutions.
Conclusion
Timothy Andrew Johnson's contributions to metrology through his patents and work at Nanometrics Inc. highlight his role as a key innovator in the field. His advancements in surface topography and via characterization are paving the way for more precise measurements in semiconductor manufacturing.
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