Schopfheim, Germany

Timo Schirmeier

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Endress + Hauser Flowtec Ag. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Timo Schirmeier. Retrieved from https://idiyas.com/inventor/timo-schirmeier

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Timo Schirmeier: Innovator in Vortex Flow Meter Technology

Introduction

Timo Schirmeier is a notable inventor based in Schopfheim, Germany. He has made significant contributions to the field of flow measurement technology, particularly with his innovative designs and patents.

Latest Patents

Timo Schirmeier holds a patent for a vortex flow meter and a method for testing it. The vortex flow meter comprises a measuring tube, a bluff body arranged within the tube, and a sensor device that includes a paddle, a sensor main body, and a piezo element. The electronic operating circuit features a measuring circuit with an operational amplifier and a capacitor. This design allows for precise measurement and testing of the flow meter's performance.

Career Highlights

Timo Schirmeier is currently employed at Endress + Hauser Flowtec AG, a company renowned for its expertise in flow measurement and automation technology. His work has contributed to advancements in the accuracy and reliability of flow measurement devices.

Collaborations

Throughout his career, Timo has collaborated with esteemed colleagues such as Dieter Schweizer and Werner Tanner. These partnerships have fostered innovation and development in the field of flow measurement.

Conclusion

Timo Schirmeier's contributions to vortex flow meter technology exemplify his commitment to innovation and excellence in engineering. His work continues to influence the industry and improve measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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