Hsinchu, Taiwan

Tien-Tien Yeh

This inventor holds 3 USPTO granted patents. Top assignee: National Yang Ming Chiao Tung University. Active years: 2021-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tien-Tien Yeh. Retrieved from https://idiyas.com/inventor/tien-tien-yeh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2021-2025

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3 patents (USPTO):Explore Patents

Title: Tien-Tien Yeh: Innovator in Optical Pulse Measurement

Introduction

Tien-Tien Yeh is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of optical measurement technology. With a total of 3 patents, his work focuses on innovative methods for measuring optical pulses.

Latest Patents

One of Tien-Tien Yeh's latest patents is a measuring device and method for optical pulses generated from a pulse light source. This method involves splitting the optical pulse and focusing them at a measuring point to generate gas plasma through the autocorrelation of the split optical pulses. The process includes receiving sound signals from the gas plasma to generate a plasma sound signal, which is then used to calculate the characteristics of the optical pulse. This innovative approach enhances the accuracy and efficiency of optical measurements.

Career Highlights

Tien-Tien Yeh is affiliated with National Yang Ming Chiao Tung University, where he continues to advance research in optical technologies. His work has garnered attention for its practical applications in various scientific fields.

Collaborations

He collaborates with notable colleagues such as Chih-Wei Luo and Yi-Chen Liu, contributing to a dynamic research environment that fosters innovation.

Conclusion

Tien-Tien Yeh's contributions to optical pulse measurement technology exemplify the spirit of innovation in modern science. His patents reflect a commitment to advancing measurement techniques, which can have far-reaching implications in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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