Company Filing History:
Years Active: 2025
Title: Tien-I Bao: Innovator in Semiconductor Technology
Introduction
Tien-I Bao is a notable inventor based in Taoyuan County, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.
Latest Patents
Tien-I Bao holds a patent for a "Method and structure for semiconductor device having gate spacer protection layer." This patent describes a method of forming a semiconductor device that includes a substrate, a gate stack, a first dielectric layer, and a gate spacer. The method involves recessing the gate spacer to expose the sidewalls of the first dielectric layer while protecting the gate stack. Additionally, it includes forming a spacer protection layer over the gate spacer, the first dielectric layer, and the source and drain contacts.
Career Highlights
Tien-I Bao is associated with Parabellum Strategic Opportunities Fund LLC, where he applies his expertise in semiconductor technology. His work has contributed to advancements in the efficiency and reliability of semiconductor devices.
Collaborations
He has collaborated with notable colleagues such as Chih Wei Lu and Chung-Ju Lee, further enhancing the innovative environment in which he works.
Conclusion
Tien-I Bao's contributions to semiconductor technology through his patent demonstrate his commitment to innovation in the field. His work continues to influence advancements in semiconductor devices, showcasing the importance of inventors in technological progress.