This inventor holds 1 USPTO granted patent. Top assignee: National Central University. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Tien-hsi Lee: Innovator in Material Surface Treatment Technology
Introduction
Tien-hsi Lee is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of material surface treatment, showcasing his innovative spirit through his patented inventions. His work focuses on enhancing the efficiency and effectiveness of surface treatment processes.
Latest Patents
Tien-hsi Lee holds a patent for "Material surface treatment equipment, material surface treatment method and silicon carbide material surface treatment method." This invention provides a material surface treatment equipment that is applied to a material substrate. The equipment includes a surface treatment device and at least one waveguide device. The surface treatment device is designed to carry the material substrate to perform a surface treatment process. Each waveguide device is utilized for introducing electromagnetic waves to the material substrate, assisting in the surface treatment process. The introduction of electromagnetic waves simplifies the surface treatment process and achieves a strengthening effect. He has 1 patent to his name.
Career Highlights
Tien-hsi Lee is affiliated with National Central University, where he continues to engage in research and development in his field. His work has garnered attention for its practical applications and innovative approach to material treatment.
Collaborations
He has collaborated with notable colleagues, including Jun-huang Wu and Yu-sheng Chiou, contributing to advancements in their shared field of expertise.
Conclusion
Tien-hsi Lee's contributions to material surface treatment technology highlight his innovative capabilities and dedication to improving industrial processes. His work continues to influence the field and inspire future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
