Hangzhou, China

Tiehan Ge

This inventor holds 7 USPTO granted patents and 1 published patent application, plus 2 CIPO patents and 5 EPO patents. Top assignees: Hangzhou Sijunsi Technology Company Limited, Zhejiang Ledison Optoelectronics Co., Ltd., Other. Active years: 2016-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tiehan Ge. Retrieved from https://idiyas.com/inventor/tiehan-ge

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 

% Patents Active = 100.0


 

Average Co-Inventor Count = 1.2

ph-index = 3

Forward Citations = 59(Granted Patents)


Company Filing History:


Years Active: 2016-2024

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7 patents (USPTO):Explore Patents

Title: The Innovative Journey of Tiehan Ge

Introduction

Tiehan Ge is a prominent inventor based in Hangzhou, China. He has made significant contributions to the field of technology, particularly in the development of lighting solutions. With a total of seven patents to his name, Tiehan has established himself as a key figure in innovation.

Latest Patents

Among his latest inventions are advancements in lamp filament technology, specifically focusing on LED filaments. These innovations reflect his commitment to enhancing energy efficiency and lighting quality.

Career Highlights

Tiehan Ge has worked with Hangzhou Sijunsi Technology Company Limited, where he has played a crucial role in various projects. His work has contributed to the company's reputation for innovation in the technology sector.

Collaborations

Tiehan has collaborated with notable colleagues, including Shichao Ge and Huabin Liu. These partnerships have fostered a creative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Tiehan Ge's journey as an inventor showcases his dedication to innovation and technology. His contributions, particularly in LED filament technology, highlight the impact of his work on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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