This inventor holds 1 USPTO granted patent. Top assignee: Lam Research Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Innovations of Tianqi Wang in Plasma Etching Technology
Introduction
Tianqi Wang is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of plasma etching technology, particularly in methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes. His innovative approach has led to the development of a unique patent that addresses critical challenges in the industry.
Latest Patents
Tianqi Wang holds a patent titled "Pulsing remote plasma for ion damage reduction and etch uniformity improvement." This patent describes a method of performing pulsed remote plasma etching. The process involves arranging a substrate in a processing chamber designed for pulsed remote plasma etching. It includes setting at least one process parameter, supplying a gas mixture to the upper chamber region, and alternating between supplying a first voltage to energize the gas mixture and turning off the voltage to generate pulsed remote plasma. This innovative method aims to reduce ion damage and improve etch uniformity, which are critical factors in semiconductor fabrication.
Career Highlights
Tianqi Wang is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to apply his expertise in plasma etching and contribute to advancements in semiconductor manufacturing technologies. His dedication to innovation has positioned him as a valuable asset to the company.
Collaborations
Tianqi collaborates with Wei Yi Luo, a talented woman in the field. Their partnership exemplifies the importance of teamwork in driving technological advancements and fostering innovation in the semiconductor industry.
Conclusion
Tianqi Wang's contributions to plasma etching technology through his patent and work at Lam Research Corporation highlight his role as a key innovator in the semiconductor field. His efforts continue to shape the future of manufacturing processes, ensuring greater efficiency and effectiveness in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
