This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: University of Electronic Science and Technology of China. Active years: 2025.
Company Filing History:
Years Active: 2025
Title: Innovations by Tianhui Sun in Microwave Surface Resistance Measurement
Introduction
Tianhui Sun is an accomplished inventor based in Sichuan, China. He has made significant contributions to the field of microwave technology, particularly in the measurement of surface resistance in dielectric conductor deposition interfaces. His innovative approach has led to the development of a unique device that simplifies the measurement process.
Latest Patents
Tianhui Sun holds a patent for a device and method for measuring microwave surface resistance of dielectric conductor deposition interfaces. This device includes a test platform, a calibration component, a sealing cavity, and a support plate. The test platform features a shielding cavity with an open bottom, a dielectric rod, an input coupling structure, an output coupling structure, and a dielectric supporter. The device allows for the measurement of the microwave surface resistance without the need for pre-measurement of relative permittivity and loss tangent of the dielectric conductor test sample. After calibration, it can obtain the microwave surface resistance through a single non-destructive measurement.
Career Highlights
Tianhui Sun is affiliated with the University of Electronic Science and Technology of China, where he continues to advance research in microwave technology. His work has garnered attention for its practical applications and innovative methodologies.
Collaborations
Tianhui Sun has collaborated with notable colleagues, including Cheng Zeng and Junsong Ning. Their combined expertise contributes to the advancement of research in their field.
Conclusion
Tianhui Sun's contributions to microwave technology through his innovative patent demonstrate his commitment to advancing measurement techniques in the field. His work not only simplifies the measurement process but also opens new avenues for research and application.