Company Filing History:
Years Active: 2023
Title: The Innovative Contributions of Tian Hao Han
Introduction
Tian Hao Han is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of technology, particularly in the area of atomic layer etching. His innovative approach has led to the development of a unique method that enhances the precision of etching processes.
Latest Patents
Tian Hao Han holds a patent for a "Method and apparatus for atomic layer etching." This patent describes a method that includes providing a substrate with a material to be etched, controlling the substrate at a specific temperature to modify the surface layer of the material, and subsequently removing the modified layer by supplying an etching gas. This innovative technique allows for greater control and efficiency in the etching process, showcasing Han's expertise in the field.
Career Highlights
Tian Hao Han is currently employed at Wonik IPS Co., Ltd., where he continues to develop and refine his inventions. His work at the company has positioned him as a key player in advancing technologies related to semiconductor manufacturing and materials processing.
Collaborations
Throughout his career, Han has collaborated with talented individuals such as Kwang Seon Jin and Sang Jun Park. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Tian Hao Han's contributions to the field of atomic layer etching exemplify his dedication to innovation and technology. His patent and ongoing work at Wonik IPS Co., Ltd. highlight his role as a significant inventor in the industry.