Thomas Vavul

Title: Innovations of Thomas Vavul in Optical Reticle Technology

Introduction

Thomas Vavul is an accomplished inventor based in San Francisco, CA. He has made significant contributions to the field of optical reticle technology, holding a total of 4 patents. His work focuses on improving the inspection and printability of reticles used in photolithography processes.

Latest Patents

One of his latest patents is titled "Time-varying intensity map generation for reticles." This invention involves an optical reticle inspection tool that performs inspections to obtain reference and test intensity values from patch areas of the reticle. By generating a difference intensity map, the tool can indicate whether the reticle has degraded over time beyond a predefined level. Another notable patent is "System and method for determining reticle defect printability." This method utilizes a pixel grid image to assess the printability of defects on a reticle or photomask. It involves determining the physical extent and transmissivity energy level of defects, which is crucial for wafer fabrication processes.

Career Highlights

Thomas Vavul is currently employed at Kla Tencor Corporation, a leading company in the field of semiconductor inspection and metrology. His innovative work has positioned him as a key figure in advancing optical reticle technology.

Collaborations

Throughout his career, Thomas has collaborated with notable coworkers such as Anthony Vacca and Donald J Parker. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Thomas Vavul's contributions to optical reticle technology through his patents and collaborations have significantly impacted the field. His innovative approaches continue to enhance the efficiency and effectiveness of photolithography processes.