Company Filing History:
Years Active: 2004
Title: Thomas Tan Vu: Innovator in Electroplating Technology
Introduction
Thomas Tan Vu is a notable inventor based in San Jose, California. He has made significant contributions to the field of electroplating technology. His innovative approach has led to the development of a unique patent that addresses challenges in the electroplating process.
Latest Patents
Thomas Tan Vu holds a patent for an "Anode and anode chamber for copper electroplating." This electroplating system includes a phosphorized anode with an average grain size of at least about 50 micrometers. The system also features plating apparatus that separates the anode from the cathode, preventing most particles generated at the anode from passing to the cathode. This separation is achieved by interposing a microporous chemical transport barrier between the anode and cathode. The design ensures that the relatively few particles generated at the large grain phosphorized copper anode do not enter the cathode chamber area, thereby avoiding defects in the part.
Career Highlights
Thomas Tan Vu is currently employed at Novellus Systems Incorporated, where he continues to innovate in the field of electroplating. His work has been instrumental in advancing the technology used in semiconductor manufacturing.
Collaborations
Throughout his career, Thomas has collaborated with notable colleagues, including Jonathan David Reid and Timothy Mark Archer. These collaborations have further enhanced his contributions to the industry.
Conclusion
Thomas Tan Vu is a distinguished inventor whose work in electroplating technology has made a significant impact. His innovative patent demonstrates his commitment to improving manufacturing processes and reducing defects in semiconductor production.