Nürtingen, Germany

Thomas Schenk

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Thomas Schenk. Retrieved from https://idiyas.com/inventor/thomas-schenk-h54m8u3e

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 40(Granted Patents)


Company Filing History:

goldMedal1 out of 834,570 
Other
 patents

Years Active: 2002

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Thomas Schenk - Innovator in High-Pressure Spray Nozzle Technology

Introduction

Thomas Schenk is a notable inventor based in Nürtingen, Germany. He has made significant contributions to the field of high-pressure spray nozzle technology. His innovative approach addresses common issues faced by existing nozzle designs, particularly wear at outlet edges.

Latest Patents

Schenk holds a patent for a high-pressure spray nozzle that features an elliptical cross-section outlet channel. This design expands in the direction of the major semiaxis, preventing wear at the outlet edge while maintaining a flat stream. The nozzle is particularly useful for applications such as de-scaling, where precision and durability are essential.

Career Highlights

Throughout his career, Thomas Schenk has focused on developing solutions that enhance the efficiency and longevity of spray nozzles. His work has been recognized for its practical applications in various industries, showcasing his commitment to innovation.

Collaborations

Schenk has collaborated with Lothar Bendig, contributing to the advancement of nozzle technology. Their partnership has fostered a creative environment that encourages the development of new ideas and solutions.

Conclusion

Thomas Schenk's contributions to high-pressure spray nozzle technology exemplify the spirit of innovation. His patented designs not only address existing challenges but also pave the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…