London, United Kingdom

Thomas S F Matic

This inventor holds 1 USPTO granted patent. Top assignee: Deckers Outdoor Corporation. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Thomas S F Matic. Retrieved from https://idiyas.com/inventor/thomas-s-f-matic

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 84(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Thomas S F Matic: Innovator in Footwear Technology

Introduction

Thomas S F Matic is a notable inventor based in London, GB. He has made significant contributions to the field of footwear technology. His innovative approach has led to the development of a unique patent that enhances the comfort and performance of footwear.

Latest Patents

Thomas holds a patent for a footwear midsole, which is designed to improve the overall user experience. This invention showcases his commitment to advancing footwear design and functionality. He has 1 patent to his name, reflecting his innovative spirit and dedication to the industry.

Career Highlights

Currently, Thomas is employed at Deckers Outdoor Corporation, a company known for its high-quality footwear products. His role at Deckers allows him to apply his inventive skills in a practical setting, contributing to the company's reputation for innovation.

Collaborations

Throughout his career, Thomas has worked alongside talented individuals such as Matthew James Head and Thomas Beaton Weightman. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in footwear technology.

Conclusion

Thomas S F Matic is a distinguished inventor whose work in footwear technology has made a lasting impact. His patent for a footwear midsole exemplifies his innovative contributions to the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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