This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: **The Innovative Contributions of Thomas R Sage in Etching Technology**
Introduction
Thomas R Sage, a talented inventor based in Endwell, NY, holds a notable patent that showcases his ingenuity in the field of etching technology. With a focus on improving methods used in manufacturing, Sage's innovative approach has the potential to benefit various applications in the electronics industry.
Latest Patents
Sage's patented innovation is titled "Method utilizing a magnetic assembly during etching thin shadow masks." This patent outlines an improved technique for etching apertures in thin metal sheets, specifically designed to create shadow masks for color picture tubes. The method introduces the use of a flat magnetic assembly to hold the metal sheet securely during the etching process, which enhances precision and efficiency.
Career Highlights
Throughout his career, Thomas R Sage has demonstrated a commitment to advancing technological methods in his field. With just one patent to his name, he has made a significant impact by developing a procedure that combines magnetic holding with traditional etching techniques. This innovation addresses common challenges in the manufacturing of shadow masks, making the process more streamlined and effective.
Collaborations
Sage has worked alongside esteemed colleagues Craig Clay Eshleman and Charles M Wetzel. Their collaboration reflects the importance of teamwork in driving innovative solutions and highlights the collective effort required to push the boundaries of technology.
Conclusion
Thomas R Sage's contributions to the realm of etching technology exemplify the essence of innovation. His patented method for utilizing magnetic assemblies during the etching of shadow masks stands as a testament to his inventive spirit and dedication to improving manufacturing processes. As the industry evolves, the impact of his work will likely continue to resonate, inspiring future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile