Beaverton, OR, United States of America

Thomas R McNeil


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: The Innovations of Thomas R. McNeil

Introduction

Thomas R. McNeil is a notable inventor based in Beaverton, Oregon, recognized for his contributions to semiconductor technology. He holds a patent that showcases his expertise in the field of ultraviolet laser ablative patterning. His work has significant implications for the manufacturing processes of microstructures in semiconductors.

Latest Patents

McNeil's patent, titled "Ultraviolet laser ablative patterning of microstructures in semiconductors," involves the rapid formation of patterns with feature sizes of less than 50 microns directly in semiconductors. This innovative technique is particularly effective for materials such as silicon, GaAs, indium phosphide, and single crystalline sapphire. The patent details the use of laser output pulses from a diode-pumped, Q-switched frequency-tripled Nd:YAG, Nd:YVO, or Nd:YLF laser, which are directed to the workpiece with high-speed precision. The optical system produces a Gaussian spot size of about 10 microns, enabling high-speed ablative processing with pulse energies exceeding 200 µJ per pulse.

Career Highlights

McNeil is associated with Electro Scientific Industries, Inc., where he has made significant contributions to the field of semiconductor manufacturing. His work has enhanced the efficiency and precision of integrated circuit connections and microcircuit workpieces. The advancements he has introduced are crucial for the ongoing evolution of semiconductor technology.

Collaborations

Throughout his career, McNeil has collaborated with esteemed colleagues such as Brian W. Baird and Michael J. Wolfe. These collaborations have fostered innovation and have contributed to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Thomas R. McNeil's innovative work in ultraviolet laser ablative patterning has made a lasting impact on semiconductor technology. His contributions continue to influence the efficiency and precision of microstructure manufacturing processes.

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