Endwell, NY, United States of America

Thomas P Gall


Average Co-Inventor Count = 3.2

ph-index = 8

Forward Citations = 270(Granted Patents)


Location History:

  • Endwell, NY (US) (1992 - 1995)
  • Lancester, NY (US) (1997 - 1998)
  • Lancaster, NY (US) (1997 - 2003)

Company Filing History:


Years Active: 1992-2003

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17 patents (USPTO):Explore Patents

Title: Innovations of Thomas P Gall

Introduction

Thomas P Gall is a notable inventor based in Endwell, NY (US). He has made significant contributions to the field of electronic structures, holding a total of 17 patents. His work focuses on innovative processes that enhance the functionality and efficiency of electronic devices.

Latest Patents

Gall's latest patents include a process for forming multi-layer electronic structures. This process involves creating a multi-layer electronic composite structure that includes a core with electrically conducting and insulating materials. The design features a plurality of plated through holes, which are essential for the attachment of electronic devices. Another recent patent by Gall is similar in nature, also focusing on the formation of multi-layer electronic structures, including a cap to further enhance the functionality of the composite.

Career Highlights

Throughout his career, Thomas P Gall has been associated with the International Business Machines Corporation (IBM). His work at IBM has allowed him to explore and develop advanced technologies in electronic structures, contributing to the company's reputation as a leader in innovation.

Collaborations

Gall has collaborated with several talented individuals in his field, including David Brian Stone and James Steven Kamperman. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Thomas P Gall's contributions to the field of electronic structures exemplify the spirit of innovation. His patents and work at IBM continue to influence the development of advanced electronic technologies.

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