Company Filing History:
2 out of 49 
1 out of 822 
1 out of 1 Years Active: 2008-2023
Title: Thomas Missalla: Innovator in EUV Lithography and High-Energy Radiation Measurement
Introduction
Thomas Missalla is a notable inventor based in Jena, Germany. He has made significant contributions to the fields of extreme ultraviolet (EUV) lithography and high-energy radiation measurement. With a total of 4 patents to his name, Missalla's work is characterized by innovative solutions that enhance measurement accuracy and efficiency.
Latest Patents
One of his latest patents is a microscopic system for testing structures and defects on EUV lithography photomasks. This advanced microscope system allows for flexible, efficient, and rapid inspection of patterns and defects on photomasks. It features a stand-alone plasma-based EUV radiation source with a specific emission spectrum, enabling precise imaging and analysis. Another significant patent involves a method for the spatially resolved measurement of parameters in a cross-section of a high-energy radiation beam bundle. This method ensures accurate data acquisition without compromising measurement integrity, utilizing innovative techniques to manage beam intensity.
Career Highlights
Throughout his career, Thomas Missalla has worked with several prominent companies, including Xtreme Technologies GmbH and Ushio Denki Kabushiki Kaisha. His experience in these organizations has allowed him to develop and refine his expertise in advanced measurement technologies.
Collaborations
Missalla has collaborated with notable colleagues such as Max Christian Schuermann and Bernd Seher. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Thomas Missalla's contributions to the fields of EUV lithography and high-energy radiation measurement demonstrate his innovative spirit and technical expertise. His patents reflect a commitment to enhancing measurement accuracy and efficiency in complex systems.