The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2008
Filed:
Aug. 09, 2004
Max C. Schuermann, Luebbecke, DE;
Bernd Seher, Jena, DE;
Lutz Mueller, Jena, DE;
Thomas Missalla, Jena, DE;
Max C. Schuermann, Luebbecke, DE;
Bernd Seher, Jena, DE;
Lutz Mueller, Jena, DE;
Thomas Missalla, Jena, DE;
XTREME Technologies GmbH, Jena, DE;
Abstract
A plasma radiation source is improved in such a way that the lifetime of the optics which is limited by the influence of debris is appreciably increased. A gas curtain through which the radiation proceeding from a source region in a vacuum chamber is emitted at a defined solid angle for debris suppression along an axis of the mean propagation direction of the radiation exits as a radially directed supersonic gas jet from a propulsion nozzle of a gas jet vacuum pump, which propulsion nozzle is arranged on the axis. The gas curtain is directed to an annular mixing nozzle that is arranged coaxial to the axis and is guided out of the vacuum chamber by a diffuser. This makes it possible to use source arrangements having an optimal conversion efficiency but extensive debris.