Succasunna, NJ, United States of America

Thomas M Wolf


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Thomas M Wolf: Innovator in Plasma Technology

Introduction

Thomas M Wolf is a notable inventor based in Succasunna, NJ (US). He has made significant contributions to the field of plasma technology, particularly through his innovative patent. His work has implications for various applications in material science and semiconductor manufacturing.

Latest Patents

Thomas M Wolf holds a patent for a method involving gas functionalized plasma developed layers. This patent describes a process where a resist is formed by the sorption of an inorganic-containing gas into an organic material. The development of the resist occurs through exposure to a plasma, such as oxygen reactive ion etching, which forms a protective compound selectively in the resist. The selected regions can be defined by patterning radiation of various types, including visible, ultraviolet, electron beam, and ion beam. In an alternate embodiment, the selected regions are defined by an overlying resist, with the gas sorption protecting the underlying layer in a bilevel resist. The protective compound can safeguard the organic resist layer during the etching of an underlying inorganic layer, such as metal, silicide, oxide, or nitride.

Career Highlights

Thomas M Wolf has had a distinguished career at AT&T Bell Laboratories, where he has been able to apply his expertise in plasma technology. His work has contributed to advancements in the field and has positioned him as a respected figure among his peers.

Collaborations

Throughout his career, Thomas has collaborated with notable colleagues, including Larry E Stillwagon and Gary N Taylor. These collaborations have fostered innovation and have led to further developments in their respective fields.

Conclusion

In summary, Thomas M Wolf is a prominent inventor whose work in gas functionalized plasma technology has made a significant impact. His patent and contributions at AT&T Bell Laboratories highlight his role in advancing material science and semiconductor applications.

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