Chapel Hill, NC, United States of America

Thomas M Mayer

This inventor holds 1 USPTO granted patent. Top assignee: Hughes Aircraft Company. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Thomas M Mayer. Retrieved from https://idiyas.com/inventor/thomas-m-mayer-avui39gr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 43(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: **Thomas M. Mayer: Innovator in Semiconductor Fabrication Techniques**

Introduction

Thomas M. Mayer is a prominent inventor based in Chapel Hill, NC, known for his contributions to the field of semiconductor fabrication. He holds a patent that showcases innovative methods for depositing metallic lines on integrated circuit (IC) chips or masks. His work has significantly advanced the techniques used in the industry, particularly through his employment at Hughes Aircraft Company.

Latest Patents

Thomas M. Mayer's patent, titled "Selective area nucleation and growth method for metal chemical vapor," presents a groundbreaking approach for utilizing focused ion beams (FIB) to create metallic lines. This method operates with a much lower ion dosage than previous techniques, measuring around 10^14 to 10^15 ions/cm^2. The process involves scanning a substrate with the FIB to establish nucleation sites, followed by exposure to a source gas while carefully controlling the substrate temperature. This innovative technique results in precise material deposition, making it compatible with various FIB processes, including lithography and implantation. Applications of this patent span the fabrication and repair of both ICs and masks.

Career Highlights

Throughout his career, Thomas M. Mayer has made significant contributions to semiconductor technology while working at Hughes Aircraft Company. His work not only underscores his expertise in focused ion beam applications but also reflects a commitment to enhancing manufacturing efficiencies in the semiconductor industry. His single patent demonstrates both technical prowess and a forward-thinking approach to innovation in materials science.

Collaborations

Throughout his career, Thomas has collaborated with other talented professionals, including notable coworker Randall L. Kubena. Their combined efforts have likely fostered advancements in their respective fields, particularly in developing new methodologies for IC fabrication.

Conclusion

Thomas M. Mayer stands out as a key inventor in the field of semiconductor technology. His patent on selective area nucleation and growth methods represents a significant advancement in the industry. With a focus on innovation, Mayer continues to influence the future of semiconductor fabrication techniques, showcasing the vital role inventors play in technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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