Rafz, Switzerland

Thomas Luthi

This inventor holds 1 USPTO granted patent. Top assignee: Siemens Nixdorf Informationssysteme Aktiengesellschaft. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Thomas Luthi. Retrieved from https://idiyas.com/inventor/thomas-luthi-i223dx70

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Thomas Luthi - Innovator in Label Application Technology

Introduction

Thomas Luthi is a notable inventor based in Rafz, Switzerland. He has made significant contributions to the field of label application technology. His innovative approach has led to the development of a unique device that enhances the efficiency of preparing and applying labels.

Latest Patents

Thomas Luthi holds a patent for a "Device for preparing and applying labels and a method of operation." This invention showcases his expertise in creating practical solutions that streamline labeling processes. He has 1 patent to his name, reflecting his commitment to innovation.

Career Highlights

Luthi is currently employed at Siemens Nixdorf Informationssysteme Aktiengesellschaft, a company known for its advancements in information technology. His role at Siemens Nixdorf allows him to further develop his ideas and contribute to cutting-edge projects in the industry.

Collaborations

Throughout his career, Thomas has collaborated with talented individuals such as Uwe Urban and Bernhard Lutz. These partnerships have enabled him to enhance his inventions and share knowledge within the field.

Conclusion

Thomas Luthi is a dedicated inventor whose work in label application technology has made a significant impact. His innovative spirit and collaboration with others in the industry continue to drive advancements in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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