Grenoble, France

Thomas Lorne


 

Average Co-Inventor Count = 5.8

ph-index = 1


Company Filing History:


Years Active: 2023-2024

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2 patents (USPTO):

Title: The Innovative Journey of Inventor Thomas Lorne

Introduction: Thomas Lorne is a notable inventor based in Grenoble, France, who has made significant contributions to the field of semiconductor technology. With two patents to his name, Lorne is recognized for his innovative approaches to creating advanced semiconductor structures that enhance radio frequency applications.

Latest Patents: Lorne's latest patents include a groundbreaking semiconductor structure comprising a buried porous layer for RF applications. This invention features a support substrate made of silicon that includes a mesoporous layer with hollow pores, primarily lined with oxide. The mesoporous layer has a thickness ranging from 3 to 40 microns and a resistivity greater than 20 kohm·cm throughout its entirety. Additionally, the substrate has a resistivity between 0.5 and 4 ohm·cm. His other recent patent details a RF substrate structure and method of production for generating a semiconductor or piezoelectric on-insulator type substrate, which incorporates a porous layer beneath the BOX layer and under a polycrystalline semiconductor material.

Career Highlights: Throughout his career, Thomas Lorne has worked with esteemed organizations, including the Commissariat à l'Énergie Atomique et aux Énergies Alternatives and Soitec. His work focuses on enhancing semiconductor technology, particularly in the domain of radio frequency applications, showcasing his expertise and innovative mindset.

Collaborations: Lorne has also collaborated with notable colleagues, including Emmanuel Augendre and Shay Reboh. These partnerships reflect the collaborative spirit inherent in the research and development of cutting-edge technologies.

Conclusion: Thomas Lorne stands out as a prominent inventor in the semiconductor field. His contributions, particularly in the development of semiconductor structures for radio frequency applications, underline his commitment to innovation and technological advancement. With two patents to his credit and a collaborative approach to research, Lorne's work holds promise for future developments in the industry.

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