Luebeck, Germany

Thomas Leyer

This inventor holds 1 USPTO granted patent. Top assignee: Dräger Medizintechnik Gmbh. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Thomas Leyer. Retrieved from https://idiyas.com/inventor/thomas-leyer-87a3zquv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 34(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Thomas Leyer - Innovator in Respiratory Flow Sensing Technology

Introduction

Thomas Leyer is a notable inventor based in Lübeck, Germany. He has made significant contributions to the field of medical technology, particularly in respiratory flow sensing. His innovative work has led to the development of a unique respiratory flow sensor that enhances patient care.

Latest Patents

Leyer holds a patent for a respiratory flow sensor with a flow channel that includes a measuring transducer and an air resistance body. This sensor is designed for use near patients and is capable of measuring a broad gas volume flow range while maintaining low breathing flow resistance. The sensor ensures good and reproducible measured signal quality, which is crucial for accurate patient monitoring.

Career Highlights

Thomas Leyer is associated with Dräger Medizintechnik GmbH, a company renowned for its medical technology solutions. His work at Dräger has focused on advancing respiratory monitoring technologies, contributing to improved healthcare outcomes.

Collaborations

Leyer has collaborated with notable colleagues, including Rainer Kunz and Götz Kullik. These partnerships have fostered innovation and development in the medical technology sector.

Conclusion

Thomas Leyer's contributions to respiratory flow sensing technology exemplify his commitment to enhancing patient care through innovation. His work continues to impact the medical field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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