This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1999.
Company Filing History:
Years Active: 1999
Title: Thomas Lester Nunes: Innovator in Electroless Nickel Deposition
Introduction
Thomas Lester Nunes is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of materials science, particularly in the area of nickel deposition processes. His innovative approach has led to advancements that benefit various industrial applications.
Latest Patents
Nunes holds a patent for a "Method for producing a low-stress electrolessly deposited nickel layer." This process describes a technique for creating a low-stress electrolessly deposited layer of nickel that yields a clean nickel film with a wettable surface. The method involves performing diffusion in a non-oxidizing environment using a gas mixture that contains nitrogen. The optimal diffusion temperature is set at a minimum of 500°C, which is significantly lower than typical prior art diffusion temperatures. The presence of nitrogen during diffusion alters the direction of the outgoing boron away from the film's surface, eliminating the need for the nickel film to be plated on refractory metal containing glass, which was previously necessary for boron diffusion.
Career Highlights
Nunes is associated with the International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore and develop innovative solutions in the field of electroless nickel deposition. His contributions have been instrumental in enhancing the efficiency and effectiveness of nickel layer production.
Collaborations
One of Nunes' notable collaborators is Charles C Goldsmith. Their partnership has likely fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
Thomas Lester Nunes is a distinguished inventor whose work in electroless nickel deposition has paved the way for advancements in materials science. His patent reflects a significant step forward in producing high-quality nickel layers, showcasing his expertise and commitment to innovation.