This inventor holds 1 USPTO granted patent. Top assignee: Kali-Chemie Aktiengesellschaft. Active years: 1994.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1994
Title: Thomas Kruck: Innovator in Copper Deposition Technology
Introduction
Thomas Kruck is a notable inventor based in Munich, Germany. He has made significant contributions to the field of materials science, particularly in the deposition of copper-containing layers. His innovative approach has implications for various applications in electronics and manufacturing.
Latest Patents
Kruck holds a patent for a process titled "Process for depositing a copper containing layer." This patent involves the deposition of a copper-containing layer on a substrate through the decomposition of a specific compound using a Chemical Vapor Deposition (CVD) process. This technology is crucial for enhancing the performance and reliability of electronic components.
Career Highlights
Throughout his career, Thomas Kruck has been associated with Kali-Chemie Aktiengesellschaft, a company known for its advancements in chemical processes and materials. His work has positioned him as a key figure in the development of innovative deposition techniques.
Collaborations
Kruck has collaborated with Christian Terfloth, contributing to the advancement of their shared projects and enhancing the research output of their team.
Conclusion
Thomas Kruck's contributions to the field of copper deposition technology exemplify the impact of innovative thinking in materials science. His patent and ongoing work continue to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile