London, United Kingdom

Thomas Hanrahan

This inventor holds 1 USPTO granted patent. Top assignee: Gestetner Manufacturing Limited. Active years: 1985.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Thomas Hanrahan. Retrieved from https://idiyas.com/inventor/thomas-hanrahan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1985

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1 patent (USPTO):Explore Patents

Title: Thomas Hanrahan: Innovator in Duplicating Technology

Introduction

Thomas Hanrahan is a notable inventor based in London, GB. He is recognized for his innovative contributions to the field of duplicating technology. His work has significantly improved the functionality and durability of duplicating stencils used in typewriters and word processors.

Latest Patents

Hanrahan holds a patent for a duplicating stencil that enhances the working life of stencil sheets. This invention involves providing the stencil sheet with flexible reinforcement at the part that first contacts the paper receiving the duplicated image. This improvement ensures that the stencil maintains its integrity and effectiveness over time.

Career Highlights

Throughout his career, Thomas Hanrahan has been associated with Gestetner Manufacturing Limited, a company known for its advancements in duplicating technology. His innovative approach has contributed to the company's reputation as a leader in the industry.

Collaborations

Hanrahan has worked alongside notable colleagues such as Jonathan Gestetner and Cyril Green. Their collaborative efforts have fostered an environment of innovation and creativity within the company.

Conclusion

In summary, Thomas Hanrahan's contributions to duplicating technology have made a lasting impact on the industry. His patent for an improved duplicating stencil exemplifies his commitment to innovation and excellence.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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