Munich, Germany

Thomas Gabler

This inventor holds 1 USPTO granted patent. Top assignee: Innovavent Gmbh. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Thomas Gabler. Retrieved from https://idiyas.com/inventor/thomas-gabler-79m3jw8d

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Thomas Gabler - Innovator in Laser Technology

Introduction

Thomas Gabler is a notable inventor based in Munich, Germany. He has made significant contributions to the field of laser technology, particularly in material processing. His innovative approach has led to the development of a unique laser system that enhances precision and efficiency in various applications.

Latest Patents

Thomas Gabler holds 1 patent for his invention titled "Anamorphotic Solid-State Laser." This advanced laser system is designed to produce a radiation line of small width and uniform high intensity in the longitudinal direction. It is capable of generating radiation with different mode numbers perpendicular to the propagation direction, making it a valuable tool in material processing.

Career Highlights

Throughout his career, Thomas has been associated with Innovavent GmbH, where he has played a crucial role in advancing laser technology. His work has not only contributed to the company's success but has also positioned him as a key figure in the industry.

Collaborations

Thomas has collaborated with esteemed colleagues such as Günter Hollemann and Peter Heist. Their combined expertise has fostered an environment of innovation and creativity, leading to groundbreaking advancements in laser applications.

Conclusion

In summary, Thomas Gabler is a distinguished inventor whose work in laser technology has made a significant impact on material processing. His innovative spirit and dedication to excellence continue to inspire future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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