Howe, TX, United States of America

Thomas G Debner

This inventor holds 2 USPTO granted patents. Top assignee: Texas Instruments Corporation. Active years: 1995-1996.


% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 56(Granted Patents)


Company Filing History:


Years Active: 1995-1996

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2 patents (USPTO):Explore Patents

Title: Thomas G Debner: Innovator in Surface Inspection and Polishing Technology

Introduction

Thomas G Debner is a notable inventor based in Howe, Texas. He has made significant contributions to the field of surface inspection and polishing technology. With a total of 2 patents, Debner's work has advanced the methods used in evaluating polished surfaces.

Latest Patents

Debner's latest patents include a method and system for inspecting polished surface texture. This innovative method utilizes a directed-energy light source to measure texture variations on highly-polished surfaces. By establishing a texture-light relationship, the method allows for precise texture measurements based on the scattered light from known texture surfaces. Another significant invention is the semiconductor polishing pad, which features a unique design with removed annular rings that enhance its polishing capabilities.

Career Highlights

Debner is associated with Texas Instruments Corporation, where he has applied his expertise in developing advanced technologies. His work has been instrumental in improving the efficiency and effectiveness of polishing processes in various applications.

Collaborations

Throughout his career, Debner has collaborated with notable colleagues, including Franklin L Allen and William L Smith. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Thomas G Debner's innovative contributions to surface inspection and polishing technology have established him as a key figure in his field. His patents reflect a commitment to advancing industry standards and improving product quality.

Profile summary based on public USPTO records.
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