Menlo Park, CA, United States of America

Thomas Furst


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Thomas Furst - Innovator in Transparent Metalized Layers

Introduction

Thomas Furst is a notable inventor based in Menlo Park, CA (US). He has made significant contributions to the field of materials science, particularly in the development of transparent metalized layers. His innovative work aims to enhance the performance of electronic devices by replacing traditional materials with more efficient alternatives.

Latest Patents

Thomas Furst holds a patent for "Indium-less transparent metalized layers." This invention involves thin indium-less 'optically porous' layers that are designed to replace conventional ITO layers. The patent describes a thin metalized film that can carry an electrical charge while allowing light transmission to or from an underlying semiconductor material. The unique pattern of small openings creates a grid of low aspect ratio fine-line metal conductors. The process for creating this optically porous metalized film includes printing a catalytic precursor material, such as palladium, on a substrate, followed by drying or curing the precursor and depositing a thin layer of metal, like copper, to form the final conductive film.

Career Highlights

Thomas Furst is currently associated with Averatek Corporation, where he continues to push the boundaries of innovation in materials technology. His work has the potential to revolutionize the way electronic devices are manufactured and function.

Collaborations

Throughout his career, Thomas has collaborated with talented individuals such as Sunity Kumar Sharma and Alex Newsom Beavers, Jr. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Thomas Furst's contributions to the field of transparent metalized layers exemplify the spirit of innovation. His work not only addresses current technological challenges but also paves the way for future advancements in electronics.

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