Milton, Canada

Thomas F Seiler

USPTO Granted Patents = 4 


Average Co-Inventor Count = 2.8

ph-index = 3

Forward Citations = 118(Granted Patents)


Location History:

  • Milton, CA (1999 - 2007)
  • Compiegne, FR (2007)

Company Filing History:


Years Active: 1999-2007

Loading Chart...
Loading Chart...
4 patents (USPTO):Explore Patents

Title: Thomas F Seiler: Innovator in Heat Exchanger Technology

Introduction

Thomas F Seiler, an inventive mind based in Milton, CA, has made notable contributions to the field of heat exchanger technology. With a strong portfolio of four patents, his innovations demonstrate a commitment to improving efficiency in thermal management systems.

Latest Patents

Among his latest patents, Seiler designed a Heat Exchanger with Flow Circuiting End Caps. This innovative device features an extruded core member with multiple spaced flow passages. The design includes unitary end caps that effectively seal and control the flow, optimizing thermal exchange processes. His second notable patent is the Plate-Type Heat Exchanger, which comprises alternating oil and coolant core plates. This setup allows for seamless fluid transitions, enhancing the efficiency of oil cooling processes by featuring strategically placed flow passages.

Career Highlights

Throughout his career, Thomas F Seiler has been associated with reputable companies such as Long Manufacturing Ltd. and Dana Canada Corporation. His work in these organizations has enabled him to apply his inventive skills and contribute significantly to advancements in thermal management technologies.

Collaborations

Seiler has worked alongside accomplished professionals, including Dario Bettio and Yuri Peric. These collaborations suggest a strong teamwork dynamic that fosters creativity and enhances the development of innovative solutions within their field.

Conclusion

Thomas F Seiler is an influential inventor whose patents reflect a deep understanding of heat exchanger systems. Through his innovations, he continues to impact the industry, setting a benchmark for future developments in thermal management technologies.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…