Rialto, CA, United States of America

Thomas E Stayonoff

This inventor holds 1 USPTO granted patent. Top assignee: Raytheon Company. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Thomas E Stayonoff. Retrieved from https://idiyas.com/inventor/thomas-e-stayonoff

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Thomas E Stayonoff: Innovator in Distributed Communications

Introduction

Thomas E Stayonoff is an accomplished inventor based in Rialto, CA (US). He has made significant contributions to the field of distributed simulations through his innovative patent. His work focuses on enhancing communication effects in simulated environments, which is crucial for modeling real-world behavior.

Latest Patents

Thomas holds a patent for a Distributed Communications Effects Module (DCEM). This method, apparatus, and computer medium are designed to provide communications effects to a simulated message in a distributed simulation. The goal of this invention is to improve the ability of distributed simulations to accurately reflect real-world scenarios.

Career Highlights

Thomas is currently employed at Raytheon Company, where he applies his expertise in communications and simulation technologies. His role at Raytheon allows him to work on cutting-edge projects that push the boundaries of simulation and communication.

Collaborations

Throughout his career, Thomas has collaborated with talented individuals such as Sherie M Johnson and Deanna K Harden. These partnerships have contributed to the success of his projects and innovations.

Conclusion

Thomas E Stayonoff is a notable inventor whose work in distributed communications has the potential to transform simulation technologies. His contributions are vital for advancing the accuracy and effectiveness of simulations in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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