Stoughton, WI, United States of America

Thomas E Page

This inventor holds 1 USPTO granted patent. Top assignee: Fleetguard, Inc.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Thomas E Page. Retrieved from https://idiyas.com/inventor/thomas-e-page

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: The Innovations of Thomas E Page

Introduction

Thomas E Page is an accomplished inventor based in Stoughton, Wisconsin. He has made significant contributions to the field of exhaust aftertreatment systems. His innovative approach has led to the development of a unique patent that enhances the efficiency of these systems.

Latest Patents

Thomas E Page holds a patent for an "Exhaust aftertreatment mixer with stamped muffler flange." This invention involves an exhaust aftertreatment system that includes the injection of chemical species. The mixer is strategically placed in the exhaust pipe between the injector and the aftertreatment element. The design incorporates a stamped muffler flange, which is a key feature of this innovative system. He has 1 patent to his name.

Career Highlights

Thomas is currently employed at Fleetguard, Inc., where he continues to work on advancements in exhaust aftertreatment technologies. His role at the company allows him to apply his expertise and contribute to the development of innovative solutions in the automotive industry.

Collaborations

One of his notable coworkers is C Raymond Cheng, with whom he collaborates on various projects. Their combined efforts contribute to the ongoing innovation at Fleetguard, Inc.

Conclusion

Thomas E Page is a notable inventor whose work in exhaust aftertreatment systems showcases his commitment to innovation. His patent reflects his ability to solve complex engineering challenges, making a significant impact in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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