Munster, Germany

Thomas Brucken

This inventor holds 1 USPTO granted patent. Top assignee: Basf Lacke+farben Ag. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Thomas Brucken. Retrieved from https://idiyas.com/inventor/thomas-brucken

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Thomas Brucken: Innovator in Coating Processes

Introduction

Thomas Brucken is a noted inventor based in Munster, Germany. His contributions to the field of material science are exemplified by his innovative approach to coating electrically conducting substrates.

Latest Patents

Thomas is the holder of a patent titled "Process for the coating of electrically conducting substrates, aqueous." This patent stands out for its application in enhancing the surface properties of various materials through innovative coating techniques.

Career Highlights

Currently, Thomas Brucken is associated with BASF Lacke + Farben AG, a leading company in the chemical industry known for its advanced coatings and materials. His role as an inventor within the company has been pivotal in driving technological advancements in product development.

Collaborations

In his professional journey, Thomas has collaborated with esteemed colleagues such as Gunther Ott and Ulrich Heimann. Their teamwork reflects a commitment to innovation and excellence in coating technologies.

Conclusion

Thomas Brucken's contributions to the field of coating processes not only demonstrate his prowess as an inventor but also underscore the importance of collaboration in driving innovation within the industry. His work continues to influence advancements in material applications, shaping the future of coating technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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